Process for the reduction of RfC≡CX impurities in fluoroolefins

ABSTRACT

This disclosure relates to processes which involve: contacting a mixture comprising at least one fluoroolefin and at least one RfC≡CX impurity with at least one zeolite to reduce the concentration of the at least one RfC≡CX impurity in the mixture; wherein Rf is a straight-chain perfluorinated alkyl group, and X is H, F, Cl, Br or I; and the at least one zeolite is selected from the group consisting of zeolites having pore opening of at least 4 Angstroms and no more than about 5 Angstroms, zeolites having pore opening of at least about 5 Angstroms and Sanderson electronegativity of no more than about 2.6, and mixtures thereof; provided that the at least one zeolite is not zeolite 4A. This disclosure also relates to processes for making at least one hydrotetrafluoropropene product selected from the group consisting of CF3CF═CH2, CF3CH═CHF, and mixtures thereof; and relates to processes for making at least one hydrochlorotrifluoropropene product selected from the group consisting of CF3CCl═CH2, CF3CH═CHCl, and mixtures thereof.

CROSS REFERENCE TO RELATED APPLICATIONS

The present application is a continuation application of U.S. patentapplication Ser. No. 14/932,042 filed Nov. 4, 2015, which is acontinuation application of U.S. patent application Ser. No. 14/210,640filed Mar. 14, 2014, which claims benefit of provisional U.S.Provisional Patent Application No. 61/791,304 filed Mar. 15, 2013, theentire contents of which are incorporated herein by reference.

BACKGROUND

Field of the Disclosure

The present disclosure relates to a process for reducing theconcentration of R_(f)C≡CX impurities in fluoroolefins by contact with azeolite.

Description of Related Art

Many industries have been working for the past few decades to findreplacements for the ozone depleting chlorofluorocarbons (CFCs) andhydrochlorofluorocarbons (HCFCs). The CFCs and HCFCs have been employedin a wide range of applications, including their use as aerosolpropellants, refrigerants, cleaning agents, expansion agents forthermoplastic and thermoset foams, heat transfer media, gaseousdielectrics, fire extinguishing and suppression agents, power cycleworking fluids, polymerization media, particulate removal fluids,carrier fluids, buffing abrasive agents, and displacement drying agents.In the search for replacements for these versatile compounds, manyindustries have turned to the use of hydrofluorocarbons (HFCs).

The HFCs do not contribute to the destruction of stratospheric ozone,but are of concern due to their contribution to the “greenhouse effect”,i.e., they contribute to global warming. As a result of theircontribution to global warming, the HFCs have come under scrutiny, andtheir widespread use may also be limited in the future. Thus, there is aneed for chemical compounds that have both low ozone depletingpotentials (ODPs) and low global warming potentials (GWPs).

BRIEF SUMMARY OF THE DISCLOSURE

The present disclosure provides a process comprising: contacting amixture comprising at least one fluoroolefin and at least one R_(f)C≡CXimpurity with at least one zeolite to reduce the concentration of saidat least one R_(f)C≡CX impurity in said mixture; wherein: (a) R_(f) is astraight-chain perfluorinated alkyl group, and X is H, F, Cl, Br or I;and (b) said at least one zeolite is selected from the group consistingof zeolites having pore opening of at least 4 Angstroms and no more thanabout 5 Angstroms, zeolites having pore opening of at least about 5Angstroms and Sanderson electronegativity of no more than about 2.6, andmixtures thereof; provided that said at least one zeolite is not zeolite4A. The present disclosure also provides a process comprising:contacting a mixture comprising at least one fluoroolefin and at leastone R_(f)C≡CX impurity with at least one zeolite to reduce theconcentration of said at least one R_(f)C≡CX impurity in said mixture;wherein: (a) R_(f) is a straight-chain perfluorinated alkyl group, and Xis H, F, Cl, Br or I; and (b) said at least one zeolite comprises azeolite having pore opening of at least about 5 Angstroms and Sandersonelectronegativity of no more than about 2.6, and mixtures thereof.

The present disclosure also provides a process for making at least onehydrotetrafluoropropene product selected from the group consisting ofCF₃CF═CH₂, CF₃CH═CHF, and mixtures thereof. The process comprises: (a)dehydrohalogenating at least one starting material selected from thegroup consisting of CF₃CFClCH₃, CF₃CHFCH₂Cl, CF₃CHClCH₂F, CF₃CH₂CHFCl,CF₃CHFCH₂F, CF₃CH₂CF₂H, CF₃CF₂CH₃, and mixtures thereof to produce aproduct mixture comprising CF₃C≡CH impurity and said at least onehydrotetrafluoropropene product; (b) contacting said product mixturewith at least one zeolite to reduce the concentration of said CF₃C≡CHimpurity in said product mixture; and (c) recovering said at least onehydrotetrafluoropropene product having reduced concentration of saidCF₃C≡CH impurity; wherein said at least one zeolite is selected from thegroup consisting of zeolites having pore opening of at least 4 Angstromsand no more than about 5 Angstroms, zeolites having pore opening of atleast about 5 Angstroms and Sanderson electronegativity of no more thanabout 2.6, and mixtures thereof; provided that said at least one zeoliteis not zeolite 4A. The present disclosure also provides a process formaking at least one hydrotetrafluoropropene product of the formulaCF₃CF═CH₂. The process comprises: (a) dehydrohalogenating at least onestarting material selected from the group consisting of CF₃CFClCH₃,CF₃CHFCH₂F, CF₃CF₂CH₃, and mixtures thereof to produce a product mixturecomprising CF₃C≡CH impurity and said at least onehydrotetrafluoropropene product; (b) contacting said product mixturewith at least one zeolite to reduce the concentration of said CF₃C≡CHimpurity in said product mixture; and (c) recovering said at least onehydrotetrafluoropropene product having reduced concentration of saidCF₃C≡CH impurity; wherein said at least one zeolite is selected from thegroup consisting of zeolites having pore opening of at least 4 Angstromsand no more than about 5 Angstroms, zeolites having pore opening of atleast about 5 Angstroms and Sanderson electronegativity of no more thanabout 2.6, and mixtures thereof; provided that said at least one zeoliteis not zeolite 4A. The present disclosure also provides a process formaking at least one hydrotetrafluoropropene product selected from thegroup consisting of CF₃CF═CH₂, CF₃CH═CHF, and mixtures thereof. Theprocess comprises: (a) dehydrohalogenating at least one startingmaterial selected from the group consisting of CF₃CFClCH₃, CF₃CHFCH₂Cl,CF₃CHClCH₂F, CF₃CH₂CHFCl, CF₃CHFCH₂F, CF₃CH₂CF₂H, CF₃CF₂CH₃, andmixtures thereof to produce a product mixture comprising CF₃C≡CHimpurity and said at least one hydrotetrafluoropropene product; (b)contacting said product mixture with at least one zeolite to reduce theconcentration of said CF₃C≡CH impurity in said product mixture; and (c)recovering said at least one hydrotetrafluoropropene product havingreduced concentration of said CF₃C≡CH impurity; wherein said at leastone zeolite comprises a zeolite having pore opening of at least about 5Angstroms and Sanderson electronegativity of no more than about 2.6, orcombination thereof.

The present disclosure also provides a process for making at least onehydrochlorotrifluoropropene product selected from the group consistingof CF₃CCl═CH₂, CF₃CH═CHCl, and mixtures thereof. The process comprises:(a) dehydrohalogenating at least one starting material selected from thegroup consisting of CF₃CCl₂CH₃, CF₃CHClCH₂Cl, CF₃CHClCH₂F, CF₃CH₂CHCl₂,CF₃CHFCH₂Cl, CF₃CFClCH₃, CF₃CH₂CHFCl, and mixtures thereof to produce aproduct mixture comprising CF₃C≡CH impurity and said at least onehydrochlorotrifluoropropene product; (b) contacting said product mixturewith at least one zeolite to reduce the concentration of said CF₃C≡CHimpurity in said product mixture; and (c) recovering said at least onehydrochlorotrifluoropropene product having reduced concentration of saidCF₃C≡CH impurity; wherein said at least one zeolite is selected from thegroup consisting of zeolites having pore opening of at least 4 Angstromsand no more than about 5 Angstroms, zeolites having pore opening of atleast about 5 Angstroms and Sanderson electronegativity of no more thanabout 2.6, and mixtures thereof; provided that said at least one zeoliteis not zeolite 4A.

DETAILED DESCRIPTION

Fluoroolefins have been found to have low ODPs and low GWPs and havebeen regarded as potential replacements for HFCs in many applications.For example, CF₃CF═CH₂ (HFO-1234yf) and CF₃CH═CHF (HFO-1234ze), havingzero ODPs and low GWPs, have been identified as potential refrigerants.For another example, CF₃CH═CHCl (HCFO-1233zd) and CF₃CCl═CH₂(HCFO-1233xf), having low ODPs and low GWPs, may be used as foamexpansion agents. HCFO-1233zd is also an intermediate in the productionof HFO-1234ze, and HCFO-1233xf is an intermediate in the production ofHFO-1234yf.

It has been found that R_(f)C≡CX impurities, such as CF₃C≡CH, are oftenpresent in the fluoroolefin products. Since R_(f)C≡CX impurities mightbe highly toxic, they need to be removed from the fluoroolefin products.

The foregoing general description and the following detailed descriptionare exemplary and explanatory only and are not restrictive of theinvention, as defined in the appended claims. Other features andbenefits of any one or more of the embodiments will be apparent from thefollowing detailed description, and from the claims.

As used herein, the terms “comprises,” “comprising,” “includes,”“including,” “has,” “having” or any other variation thereof, areintended to cover a non-exclusive inclusion. For example, a process,method, article, or apparatus that comprises a list of elements is notnecessarily limited to only those elements but may include otherelements not expressly listed or inherent to such process, method,article, or apparatus. Further, unless expressly stated to the contrary,“or” refers to an inclusive or and not to an exclusive or. For example,a condition A or B is satisfied by any one of the following: A is true(or present) and B is false (or not present), A is false (or notpresent) and B is true (or present), and both A and B is true (orpresent).

Also, use of “a” or “an” are employed to describe elements andcomponents described herein. This is done merely for convenience and togive a general sense of the scope of the invention. This descriptionshould be read to include one or at least one and the singular alsoincludes the plural unless it is obvious that it is meant otherwise.

Unless otherwise defined, all technical and scientific terms used hereinhave the same meaning as commonly understood by one of ordinary skill inthe art to which this invention belongs. In case of conflict, thepresent specification, including definitions, will control. Althoughmethods and materials similar or equivalent to those described hereincan be used in the practice or testing of embodiments of the presentinvention, suitable methods and materials are described below. Inaddition, the materials, methods, and examples are illustrative only andnot intended to be limiting.

When an amount, concentration, or other value or parameter is given aseither a range, preferred range or a list of upper preferable valuesand/or lower preferable values, this is to be understood as specificallydisclosing all ranges formed from any pair of any upper range limit orpreferred value and any lower range limit or preferred value, regardlessof whether ranges are separately disclosed. Where a range of numericalvalues is recited herein, unless otherwise stated, the range is intendedto include the endpoints thereof, and all integers and fractions withinthe range.

Before addressing details of embodiments described below, some terms aredefined or clarified.

HFO-1234ze may exist as one of two configurational isomers, E or Z.HFO-1234ze as used herein refers to the isomers, E-HFO-1234ze orZ-HFO-1234ze, as well as any combinations or mixtures of such isomers.

HCFO-1233zd also may exist as one of two configurational isomers, E orZ. HCFO-1233zd as used herein refers to the isomers, E-HCFO-1233zd orZ-HCFO-1233zd, as well as any combinations or mixtures of such isomers.

CF₃CF═CHCl (HCFO-1224yd) also may exist as one of two configurationalisomers, E or Z. HCFO-1224yd as used herein refers to the isomers,E-HCFO-1224yd or Z-HCFO-1224yd, as well as any combinations or mixturesof such isomers.

CF₃CCl═CHCl (HCFO-1223xd) also may exist as one of two configurationalisomers, E or Z. HCFO-1223xd as used herein refers to the isomers,E-HCFO-1223xd or Z-HCFO-1223xd, as well as any combinations or mixturesof such isomers.

The term “pore opening”, as used herein, means the mouth of the pore bywhich the R_(f)C≡CX impurity enters the body of the pore.

The term “R_(f)C≡CX impurity”, as used herein, means the impurity of theformula R_(f)C≡CX present in a fluoroolefin product.

The term “fluoroolefin”, as used herein, means a molecule containinghydrogen, carbon, fluorine, and a carbon-carbon double bond andoptionally chlorine. Examples are described throughout the instantspecification.

The term “hydrofluoroolefin”, as used herein, means a moleculecontaining hydrogen, carbon, fluorine, and a carbon-carbon double bond.

The term “hydrochlorofluoroolefin”, as used herein, means a moleculecontaining hydrogen, carbon, chlorine, fluorine, and a carbon-carbondouble bond.

The term “alkyl”, as used herein, either alone or in compound words suchas “perfluorinated alkyl group”, includes cyclic or acyclic andstraight-chain or branched alkyl groups having 1-6 carbon atoms, suchas, methyl, ethyl, n-propyl, i-propyl, n-butyl, sec-butyl, tert-butyl,isobutyl, n-pentyl, isopentyl, neopentyl, 3-methylbutane,2,3-dimethyl-propane,n-hexyl, and the various other isomers of n-hexyl.

The term “straight-chain perfluorinated alkyl group”, as used herein,means a straight-chain alkyl group wherein all hydrogens on carbon atomshave been substituted by fluorines. Examples of a straight-chainperfluorinated alkyl group include —CF₃, —CF₂CF₃ and —CF₂CF₂CF₃.

The term “aralkyl”, as used herein, means an alkyl group wherein one ormore hydrogens on carbon atoms have been substituted by an aryl group,such as phenyl or naphthyl and the like. Examples of an aralkyl groupinclude CeH₅CH₂—, phenethyl, and the like.

The term “ppm”, as used herein, means parts per million by weight.

The term “dehydrohalogenation”, as used herein, meansdehydrofluorination or dehydrochlorination. The term“dehydrohalogenating”, as used herein, means dehydrofluorinating ordehydrochlorinating. The term “dehydrohalogenated”, as used herein,means dehydrofluorinated or dehydrochlorinated.

The term “dehydrofluonnation”, “dehydrofluorinating” or“dehydrofluorinated”, as used herein, means a process during whichhydrogen and fluorine on adjacent carbons in a molecule are removed.

The term “dehydrochlorination”, “dehydrochlorinating”, or“dehydrochlorinated”, as used herein, means a process during whichhydrogen and chlorine on adjacent carbons in a molecule are removed.

The term “an elevated temperature”, as used herein, means a temperaturehigher than the room temperature.

The present disclosure provides a process for reducing the amount ofR_(f)C≡CX impurity from fluoroolefin by contacting fluoroolefincontaining R_(f)C≡CX impurity with a zeolite. The process comprises:contacting a mixture comprising at least one fluoroolefin and at leastone R_(f)C≡CX impurity with at least one zeolite to reduce theconcentration of said at least one R_(f)C≡CX impurity in said mixture;wherein: (a) R_(f) is a straight-chain perfluorinated alkyl group, and Xis H, F, Cl, Br or I; and (b) said at least one zeolite is selected fromthe group consisting of zeolites having pore opening of at least 4Angstroms and no more than about 5 Angstroms, zeolites having poreopening of at least about 5 Angstroms and Sanderson electronegativity ofno more than about 2.6, and mixtures thereof; provided that said atleast one zeolite is not zeolite 4A. In some embodiments of thisinvention, the process further comprises recovering said at least onefluoroolefin having reduced concentration of said at least one R_(f)C≡CXimpurity.

In some embodiments of this invention, the amount of the at least onefluoroolefin in the mixture is at least 50 wt % based on the totalweight of the mixture. In some embodiments of this invention, the amountof the at least one fluoroolefin in the mixture is at least 70 wt %based on the total weight of the mixture. In some embodiments of thisinvention, the amount of the at least one fluoroolefin in the mixture isat least 90 wt % based on the total weight of the mixture. In someembodiments of this invention, the mixture consists essentially of theat least one fluoroolefin and the at least one R_(f)C≡CX impurity.

A fluoroolefin in this disclosure can be a hydrofluoroolefin or ahydrochlorofluoroolefin. In some embodiments of this invention, the atleast one fluoroolefin is hydrofluoroolefin. In some embodiments of thisinvention, the at least one fluoroolefin is hydrochlorofluoroolefin. Insome embodiments of this invention, the at least one hydrofluoroolefinis selected from the group consisting of CF₃CF═CH₂ (HFO-1234yf),CF₃CH═CHF (HFO-1234ze), CF₃CH═CH₂ (HFO-1243zf), CF₃CH═CF₂ (HFO-1225zc),CF₃CF═CHF (HFO-1225ye), and mixtures thereof. In other embodiments ofthis invention, the at least one hydrofluoroolefin is selected from thegroup consisting of CF₃CF═CH₂ (HFO-1234yf), CF₃CH═CH₂ (HFO-1243zf),CF₃CH═CF₂(HFO-1225zc), CF₃CF═CHF (HFO-1225ye), and mixtures thereof. Insome embodiments of this invention, the at least onehydrochlorofluoroolefin is selected from the group consisting ofCF₃CCl═CH₂ (HCFO-1233xf), CF₃CH═CHCl (HCFO-1233zd), CF₃CF═CHCl(HCFO-1224yd), CF₃CH═CCl₂ (HCFO-1223za), CF₃CCl═CHCl (HCFO-1223xd),CF₃CH═CFCl, CF₃CCl═CHF, and mixtures thereof. In some embodiments ofthis invention, the at least one fluoroolefin is selected from the groupconsisting of CF₃CF═CH₂, CF₃CH═CHF, CF₃CH═CH₂, CF₃CCl═CH₂, CF₃CH═CHCl,CF₃CH═CFCl, CF₃CH═CF₂, CF₃CCl═CHF, CF₃CF═CHF, CF₃CF═CHCl, CF₃CH═CCl₂,CF₃CCl═CHCl, and mixtures thereof. In other additional embodiments ofthis invention, the at least one fluoroolefin is selected from the groupconsisting of CF₃CF═CH₂, CF₃CH═CH₂, CF₃CCl═CH₂, CF₃CH═CHCl, CF₃CH═CFCl,CF₃CH═CF₂, CF₃CCl═CHF, CF₃CF═CHF, CF₃CF═CHCl, CF₃CH═CCl₂, CF₃CCl═CHCl,and mixtures thereof. In some embodiments of this invention, thehydrofluoroolefin is at least one hydrotetrafluoropropene productselected from the group consisting of CF₃CF═CH₂, CF₃CH═CHF, and mixturesthereof. In other embodiments of this invention, the at least onefluoroolefin is CF₃CF═CH₂. In some embodiments of this invention, thehydrochlorofluoroolefin is at least one hydrochlorotrifluoropropeneproduct selected from the group consisting of CF₃CCl═CH₂, CF₃CH═CHCl,and mixtures thereof.

During the processes of making fluoroolefin and its precursors,R_(f)C≡CX impurities may be generated as byproducts. For example, duringthe dehydrochlorination process of CF₃CFClCH₃ (HCFC-244bb) to makeHFO-1234yf, CF₃C≡CH impurity has been found present in the productmixture with HFO-1234yf. CF₃C≡CH impurity and/or CF₃C≡CCl impurity mayalso be present in the HCFC-244bb starting material.

The R_(f)C≡CX impurity that is removed from fluoroolefin by processes ofthis disclosure is a fluorinated terminal alkyne. In some embodiments ofthis invention, R_(f) is —CF₃. In some embodiments of this invention,R_(f) is —CF₂CF₃. In some embodiments of this invention, the at leastone R_(f)C≡CX impurity is selected from the group consisting of CF₃C≡CH,CF₃C≡CCl, CF₃C≡CF, and mixtures thereof. In other embodiments, the atleast one R_(f)C≡CX impurity is selected from the group consisting of,CF₃C≡CCl, CF₃C≡CF, and mixtures thereof. In some embodiments of thisinvention, the at least one R_(f)C≡CX impurity is selected from thegroup consisting of CF₃C≡CH, CF₃C≡CCl, and mixtures thereof. In someembodiments of this invention, the at least one R_(f)C≡CX impurity isCF₃C≡CH. In some embodiments of this invention, the at least oneR_(f)C≡CX impurity is CF₃C≡CCl.

In some embodiments of this invention, the at least one fluoroolefin isselected from the group consisting of CF₃CF═CH₂, CF₃CH═CHF, CF₃CH═CH₂,CF₃CCl═CH₂, CF₃CH═CHCl, CF₃CH═CFCl, CF₃CH═CF₂, CF₃CCl═CHF, CF₃CF═CHF,CF₃CF═CHCl, CF₃CH═CCl₂, CF₃CCl═CHCl, and mixtures thereof, and the atleast one R_(f)C≡CX impurity is selected from the group consisting ofCF₃C≡CH, CF₃C≡CCl, CF₃C≡CF, and mixtures thereof. In some embodiments ofthis invention, the at least one fluoroolefin is selected from the groupconsisting of CF₃CF═CH₂, CF₃CH═CH₂, CF₃CCl═CH₂, CF₃CH═CHCl, CF₃CH═CFCl,CF₃CH═CF₂, CF₃CCl═CHF, CF₃CF═CHF, CF₃CF═CHCl, CF₃CH═CCl₂, CF₃CCl═CHCl,and mixtures thereof, and the at least one R_(f)C≡CX impurity isselected from the group consisting of CF₃C≡CH, CF₃C≡CCl, CF₃C≡CF, andmixtures thereof. In other embodiments of this invention, the at leastone fluoroolefin is selected from the group consisting of CF₃CF═CH₂,CF₃CH═CHF, CF₃CH═CH₂, CF₃CCl═CH₂, CF₃CH═CHCl, CF₃CH═CFCl, CF₃CH═CF₂,CF₃CCl═CHF, CF₃CF═CHF, CF₃CF═CHCl, CF₃CH═CCl₂, CF₃CCl═CHCl, and mixturesthereof, and the at least one R_(f)C≡CX impurity is selected from thegroup consisting of CF₃C≡CCl, CF₃C≡CF, and mixtures thereof.

In some embodiments of this invention, the at least one fluoroolefin isselected from the group consisting of CF₃CF═CH₂, CF₃CH═CHF, CF₃CH═CH₂,CF₃CCl═CH₂, CF₃CH═CHCl, CF₃CF═CHCl, and mixtures thereof, and the atleast one R_(f)C≡CX impurity is selected from the group consisting ofCF₃C≡CH, CF₃C≡CCl, CF₃C≡CF, and mixtures thereof, while in otherembodiments of this invention, the at least one fluoroolefin is selectedfrom the group consisting of CF₃CF═CH₂, CF₃CH═CH₂, CF₃CCl═CH₂,CF₃CH═CHCl, CF₃CF═CHCl, and mixtures thereof, and the at least oneR_(f)C≡CX impurity is selected from the group consisting of CF₃C≡CH,CF₃C≡CCl, CF₃C≡CF, and mixtures thereof.

In some embodiments of this invention, the at least one fluoroolefin isCF₃CH═CH₂, and the at least one R_(f)C≡CX impurity is selected from thegroup consisting of CF₃C≡CH, CF₃C≡CCl, CF₃C≡CF, and mixtures thereof.

In some embodiments of this invention, the at least one fluoroolefin isselected from the group consisting of CF₃CF═CH₂, CF₃CH═CHF, CF₃CCl═CH₂,CF₃CH═CHCl, and mixtures thereof, and the at least one R_(f)C≡CXimpurity is selected from the group consisting of CF₃C≡CH, CF₃C≡CCl, andmixtures thereof. In some embodiments of this invention, the at leastone fluoroolefin is selected from the group consisting of CF₃CF═CH₂,CF₃CCl═CH₂, CF₃CH═CHCl, and mixtures thereof, and the at least oneR_(f)C≡CX impurity is selected from the group consisting of CF₃C≡CH,CF₃C≡CCl, and mixtures thereof.

In some embodiments of this invention, the at least one fluoroolefin isselected from the group consisting of CF₃CF═CH₂, CF₃CH═CHF, CF₃CCl═CH₂,CF₃CH═CHCl, and mixtures thereof, and the at least one R_(f)C≡CXimpurity is CF₃C≡CH. In some embodiments of this invention, the at leastone fluoroolefin is selected from the group consisting of CF₃CF═CH₂,CF₃CCl═CH₂, CF₃CH═CHCl, and mixtures thereof, and the at least oneR_(f)C≡CX impurity is CF₃C≡CH,

In some embodiments of this invention, the at least one fluoroolefin isCF₃CF═CH₂, and the at least one R_(f)C≡CX impurity is selected from thegroup consisting of CF₃C≡CH, CF₃C≡CCl, and mixtures thereof.

In some embodiments of this invention, the at least one fluoroolefin isCF₃CF═CH₂, and the at least one R_(f)C≡CX impurity is CF₃C≡CH.

In some embodiments of this invention, the at least one fluoroolefin isCF₃CH═CHF, and the at least one R_(f)C≡CX impurity is selected from thegroup consisting of CF₃C≡CH, CF₃C≡CCl, and mixtures thereof. In someembodiments, the at least one fluoroolefin is CF₃CH═CHF, and the atleast one R_(f)C≡CX impurity is selected from the group consisting ofCF₃C≡CH, CF₃C≡CCl, and mixtures thereof, wherein said at least onezeolite comprises a zeolite having pore opening of at least about 5Angstroms and Sanderson electronegativity of no more than about 2.6, orcombination thereof.

In some embodiments of this invention, the at least one fluoroolefin isCF₃CH═CHF, and the at least one R_(f)C≡CX impurity is CF₃C≡CH. In otherembodiments, the at least one fluoroolefin is CF₃CH═CHF, and the atleast one R_(f)C≡CX impurity is CF₃C≡CH and at least one zeolitecomprises a zeolite having pore opening of at least about 5 Angstromsand Sanderson electronegativity of no more than about 2.6, orcombination thereof.

In some embodiments of this invention, the at least one fluoroolefin isa mixture of CF₃CF═CH₂ and CF₃CH═CHF, and the at least one R_(f)C≡CXimpurity is selected from the group consisting of CF₃C≡CH, CF₃C≡CCl, andmixtures thereof. In other embodiments of this invention, the at leastone fluoroolefin is a mixture of CF₃CF═CH₂ and CF₃CH═CHF, and the atleast one R_(f)C≡CX impurity is selected from the group consisting ofCF₃C≡CH, CF₃C≡CCl, and mixtures thereof, and the at least one zeolite isselected from the group consisting of zeolites having pore opening of atleast about 5 Angstroms and Sanderson electronegativity of no more thanabout 2.6, and mixtures thereof. In some embodiments of this invention,the at least one fluoroolefin to be produced is CF₃CF═CH₂ and the atleast one R_(f)C≡CX impurity is selected from the group consisting ofCF₃C≡CH, CF₃C≡CCl, and mixtures thereof.

In some embodiments of this invention, the at least one fluoroolefin isa mixture of CF₃CF═CH₂ and CF₃CH═CHF, and the at least one R_(f)C≡CXimpurity is CF₃C≡CH. In other embodiments of the present invention, theat least one fluoroolefin is CF₃CF═CH₂, and the at least one R_(f)C≡CXimpurity is CF₃C≡CH. In other embodiments, the at least one fluoroolefinis a mixture of CF₃CF═CH₂ and CF₃CH═CHF, and the at least one R_(f)C≡CXimpurity is CF₃C≡CH and at least one zeolite comprises a zeolite havingpore opening of at least about 5 Angstroms and Sandersonelectronegativity of no more than about 2.6, or combination thereof.

In some embodiments of this invention, the at least one fluoroolefin isselected from the group consisting of CF₃CCl═CH₂, CF₃CH═CHCl, andmixtures thereof, and the at least one R_(f)C≡CX impurity is selectedfrom the group consisting of CF₃C≡CH, CF₃C≡CCl, and mixtures thereof.

In some embodiments of this invention, the at least one fluoroolefin isselected from the group consisting of CF₃CCl═CH₂, CF₃CH═CHCl, andmixtures thereof, and the at least one R_(f)C≡CX impurity is CF₃C≡CH.

In some embodiments of this invention, the at least one fluoroolefin isCF₃CH═CHCl, and the at least one R_(f)C≡CX impurity is selected from thegroup consisting of CF₃C≡CH, CF₃C≡CCl, and mixtures thereof.

In some embodiments of this invention, the at least one fluoroolefin isCF₃CH═CHCl, and the at least one R_(f)C≡CX impurity is CF₃C≡CH.

In some embodiments of this invention, the at least one fluoroolefin isCF₃CCl═CH₂, and the at least one R_(f)C≡CX impurity is selected from thegroup consisting of CF₃C≡CH, CF₃C≡CCl, and mixtures thereof.

In some embodiments of this invention, the at least one fluoroolefin isCF₃CCl═CH₂, and the at least one R_(f)C≡CX impurity is CF₃C≡CH.

It has been found through experiments that R_(f)C≡CX impurity can beremoved from fluoroolefin by contacting with a zeolite selected from thegroup consisting of zeolites having pore opening of at least 4 Angstromsand no more than about 5 Angstroms, zeolites having pore opening of atleast about 5 Angstroms and Sanderson electronegativity of no more thanabout 2.6, and mixtures thereof; provided that said at least one zeoliteis not zeolite 4A. In other embodiments, the zeolites utilized have poreopenings of at least 4 Angstroms and no more than about 5 Angstroms, orcombination of more than one thereof, while in other embodiments, thezeolite used is the zeolite having pore opening of at least about 5Angstroms and Sanderson electronegativity of no more than about 2.6, andcombination thereof or the zeolite utilized is a mixture of at least onezeolite having pore openings of at least 4 Angstroms and no more thanabout 5 Angstroms and at least one zeolite having pore opening of atleast about 5 Angstroms and Sanderson electronegativity of no more thanabout 2.6.

The contacting step of this disclosure can be carried out usingwell-known chemical engineering practices for scrubbing organiccompounds, which includes continuous, semi-continuous or batchoperations. In some embodiments of this invention, the contacting stepcan be carried out by passing a gaseous or liquid mixture offluoroolefin and R_(f)C≡CX impurity through a bed of zeolite. Stirringand agitation of the bed may be carried out through use of knownmethods. In some embodiments of this invention, fluoroolefin containingR_(f)C≡CX impurity is mixed with zeolite in a vessel equipped with anagitator.

In some embodiments of this invention, the temperature during thecontacting step is from about −20° C. to about 200° C. In someembodiments of this invention, the temperature during the contactingstep is from about 0° C. to about 100° C. In some embodiments of thisinvention, the temperature during the contacting step is from about 10°C. to about 60° C. In some embodiments of this invention, thetemperature during the contacting step is about room temperature. Thepressure during the contacting step is not critical and can be in therange of from about 10 kPa to about 3000 kPa.

During the contacting step, the mixture of fluoroolefin and R_(f)C≡CXimpurity is scrubbed with zeolite in the contacting vessel, and theR_(f)C≡CX impurity is removed. In some embodiments of this invention,the concentration of the at least one R_(f)C≡CX impurity in the mixtureis reduced to 300 ppm or less. In some embodiments of this invention,the concentration of the at least one R_(f)C≡CX impurity in the mixtureis reduced to 200 ppm or less. In some embodiments of this invention,the concentration of the at least one R_(f)C≡CX impurity in the mixtureis reduced to 100 ppm or less. In some embodiments of this invention,the amount of the at least one R_(f)C≡CX impurity in the mixture isreduced at least about 20% by weight relative to the amount originallypresent. In some embodiments of this invention, the amount of the atleast one R_(f)C≡CX impurity in the mixture is reduced at least about30% by weight relative to the amount originally present. In someembodiments of this invention, the amount of the at least one R_(f)C≡CXimpurity in the mixture is reduced at least about 45% by weight relativeto the amount originally present.

The fluoroolefin having reduced concentration of the R_(f)C≡CX impurityobtained from the contacting step can be recovered using techniqueswell-known in the art, such as condensation or distillation. In someembodiments of this invention, the fluoroolefin obtained from thecontacting step may be further purified by fractional distillation.

Zeolites with sorbed R_(f)C≡CX impurity can be regenerated by desorptionof the R_(f)C≡CX impurity and other sorbed components (if present).Desorption may be effected with or without the use of a purge liquid orgas flow. In some embodiments of this invention, the desorption iscarried out at an elevated temperature with a purge gas such as air ornitrogen.

In general, desorption can be effected by changing any thermodynamicvariable which is effective in removing the sorbed components (i.e.,R_(f)C≡CX impurity and other sorbed components if also present) from thezeolite. For example, sorption and desorption may be effected using athermal swing cycle (e.g., where after a period of sorption, the zeoliteis heated such that sorbed components are desorbed); or using a pressureswing cycle or vacuum swing cycle (e.g., where after a period ofsorption, the pressure is reduced such that sorbed components aredesorbed). The thermal swing cycle and the pressure swing cycle orvacuum swing cycle can be combined.

The present disclosure also provides a process for making at least onehydrotetrafluoropropene product selected from the group consisting ofCF₃CF═CH₂, CF₃CH═CHF, and mixtures thereof. The process comprises: (a)dehydrohalogenating at least one starting material selected from thegroup consisting of CF₃CFClCH₃, CF₃CHFCH₂Cl, CF₃CHClCH₂F, CF₃CH₂CHFCl,CF₃CHFCH₂F, CF₃CH₂CF₂H, CF₃CF₂CH₃, and mixtures thereof to produce aproduct mixture comprising CF₃C≡CH impurity and said at least onehydrotetrafluoropropene product; (b) contacting said product mixturewith at least one zeolite to reduce the concentration of said CF₃C≡CHimpurity in said product mixture; and (c) recovering said at least onehydrotetrafluoropropene product having reduced concentration of saidCF₃C≡CH impurity; wherein said at least one zeolite is selected from thegroup consisting of zeolites having pore opening of at least 4 Angstromsand no more than about 5 Angstroms, zeolites having pore opening of atleast about 5 Angstroms and Sanderson electronegativity of no more thanabout 2.6, and mixtures thereof; provided that said at least one zeoliteis not zeolite 4A. In another embodiment, the present disclosure alsoprovides a process for making at least one hydrotetrafluoropropeneproduct selected from the group consisting of CF₃CF═CH₂, CF₃CH═CHF, andmixtures thereof, wherein the process comprises: (a) dehydrohalogenatingat least one starting material selected from the group consisting ofCF₃CFClCH₃, CF₃CHFCH₂Cl, CF₃CHClCH₂F, CF₃CH₂CHFCl, CF₃CHFCH₂F,CF₃CH₂CF₂H, CF₃CF₂CH₃, and mixtures thereof to produce a product mixturecomprising CF₃C≡CH impurity and said at least onehydrotetrafluoropropene product; (b) contacting said product mixturewith at least one zeolite to reduce the concentration of said CF₃C≡CHimpurity in said product mixture; and (c) recovering said at least onehydrotetrafluoropropene product having reduced concentration of saidCF₃C≡CH impurity; wherein said at least one zeolite is selected from thegroup consisting of zeolites having pore opening of at least about 5Angstroms and Sanderson electronegativity of no more than about 2.6, andmixtures thereof. In still another embodiment, the present disclosurealso provides a process for making CF₃CF═CH₂, which process comprises:(a) dehydrohalogenating at least one starting material selected from thegroup consisting of CF₃CFClCH₃, CF₃CHFCH₂Cl, CF₃CHFCH₂F, CF₃CF₂CH₃, andmixtures thereof to produce a product mixture comprising CF₃C≡CHimpurity and said at least one hydrotetrafluoropropene product; (b)contacting said product mixture with at least one zeolite to reduce theconcentration of said CF₃C≡CH impurity in said product mixture; and (c)recovering said at least one hydrotetrafluoropropene product havingreduced concentration of said CF₃C≡CH impurity; wherein said at leastone zeolite is selected from the group consisting of zeolites havingpore opening of at least 4 Angstroms and no more than about 5 Angstroms,zeolites having pore opening of at least about 5 Angstroms and Sandersonelectronegativity of no more than about 2.6, and mixtures thereof;provided that said at least one zeolite is not zeolite 4A.

The present disclosure also provides a process for making at least onehydrochlorotrifluoropropene product selected from the group consistingof CF₃CCl═CH₂, CF₃CH═CHCl, and mixtures thereof. The process comprises:(a) dehydrohalogenating at least one starting material selected from thegroup consisting of CF₃CCl₂CH₃, CF₃CHClCH₂Cl, CF₃CHClCH₂F, CF₃CH₂CHCl₂,CF₃CHFCH₂Cl, CF₃CFClCH₃, CF₃CH₂CHFCl, and mixtures thereof to produce aproduct mixture comprising CF₃C≡CH impurity and said at least onehydrochlorotrifluoropropene product; (b) contacting said product mixturewith at least one zeolite to reduce the concentration of said CF₃C≡CHimpurity in said product mixture; and (c) recovering said at least onehydrochlorotrifluoropropene product having reduced concentration of saidCF₃C≡CH impurity; wherein said at least one zeolite is selected from thegroup consisting of zeolites having pore opening of at least 4 Angstromsand no more than about 5 Angstroms, zeolites having pore opening of atleast about 5 Angstroms and Sanderson electronegativity of no more thanabout 2.6, and mixtures thereof; provided that said at least one zeoliteis not zeolite 4A.

In some embodiments of this invention, the dehydrohalogenation processis carried out by pyrolyzing (thermally dehydrohalogenating) thestarting material to produce the hydrotetrafluoropropene orhydrochlorotrifluoropropene product. The term “pyrolyzing” or“pyrolysis”, as used herein, means chemical change produced by heatingin the absence of catalyst. By absence of catalyst is meant that nomaterial or treatment is added to the pyrolysis reactor that increasesthe reaction rate by reducing the activation energy of the pyrolysisprocess.

Suitable reactors for pyrolysis may be of any shape consistent with theprocess. In some embodiments of this invention, the reactor is acylindrical tube, either straight or coiled. Heat is applied to theoutside of the tube, with the chemical reaction taking place on theinside of the tube. Of note are pyrolysis reactors wherein the flow ofgases through the reactor is partially obstructed to cause back-mixing,i.e. turbulence, and thereby promote mixing of gases and good heattransfer. This partial obstruction can be conveniently obtained byplacing packing within the interior of the reactor, filling itscross-section or by using perforated baffles. The reactor packing can beparticulate or fibrillar, has an open structure like that of RaschigRings or other packings with a high free volume to avoid theaccumulation of coke and to minimize pressure drop, and permits agenerally free flow of gas. In some embodiments of this invention, thereactor packing is in cartridge disposition for ease of insertion andremoval. In some embodiments of this invention, the pyrolysis reactor issubstantially empty which means that the free volume of the reactionzone is at least about 80%, and in another embodiment, at least about90%, and in another embodiment at least about 95%. The free volume isthe volume of the reaction zone minus the volume of the material thatmakes up the reactor packing, and the % free volume is the ratio of thefree volume relative to the total volume of the reactor times 100.

In some embodiments of this invention, the pyrolysis reactor iscomprised of materials which are resistant to corrosion includingstainless steel, Hastelloy™, Inconel™, Monel™, gold, or gold-lined orquartz.

The dehydrohalogenation process of this disclosure can be either adehydrofluorination process or a dehydrochlorination process dependingon the starting material and the corresponding fluoroolefin product.Typically, the pyrolysis temperature for dehydrofluorination is higherthan the one for dehydrochlorination. In some embodiments of thisinvention, the dehydrofluorinating pyrolysis is conducted at atemperature of from about 600° C. to about 900° C. In some embodimentsof this invention, the dehydrochlorinating pyrolysis is conducted at atemperature of from about 400° C. to about 700° C. Pyrolysis processeshave also been disclosed in U.S. Pat. No. 7,833,434, U.S. PatentPublication No. 2010-0105967, and U.S. Patent Publication No.2010-0105967.

In some embodiments of this invention, the dehydrohalogenation processis carried out in the presence of a catalyst. Suitable catalysts fordehydrohalogenation include alumina, fluorided alumina, aluminumfluoride, aluminum chlorofluoride; metal compounds supported on alumina,fluorided alumina, aluminum fluoride, or aluminum chlorofluoride;chromium oxide (Cr₂O₃), fluorided chromium oxide, and cubic chromiumtrifluoride; oxides, fluorides, and oxyfluorides of magnesium, zinc andmixtures of magnesium and zinc and/or aluminum; lanthanum oxide andfluorided lanthanum oxide; carbon, and metal compounds supported oncarbon. The metal compounds are oxides, fluorides, and oxyfluorides ofat least one metal selected from the group consisting of sodium,potassium, rubidium, cesium, yttrium, lanthanum, cerium, praseodymium,neodymium, samarium, chromium, iron, cobalt, rhodium, nickel, copper,zinc, and mixtures thereof. In some embodiments of this invention, thedehydrohalogenation catalyst is selected from the group consisting ofcarbon, alumina, fluorided alumina, and mixtures thereof. In someembodiments of this invention, carbon includes acid-washed carbon,activated carbon and three dimensional matrix carbonaceous materials. Insome embodiments of this invention, the dehydrohalogenation catalystcomprises alkali metal salt supported on chromium oxide. The catalyticdehydrohalogenation processes have also been disclosed in U.S. Pat. No.7,943,015, U.S. Pat. No. 7,897,823, and U.S. Pat. No. 7,985,884.

In some embodiments of this invention, the dehydrohalogenation processis carried out by reacting the starting material with a basic aqueoussolution to produce the hydrotetrafluoropropene orhydrochlorotrifluoropropene product. As used herein, the basic aqueoussolution is a liquid that is primarily an aqueous liquid having a pH ofover 7, and the liquid may be a solution, dispersion, emulsion,suspension or the like. In some embodiments of this invention, the basicaqueous solution has a pH of 8 or higher. In some embodiments of thisinvention, the basic aqueous solution has a pH of 10 or higher.Typically, a dehydrofluorination process needs a higher pH solution thana dehydrochlorination process.

In embodiments of this invention, an inorganic base is used to form thebasic aqueous solution. Such inorganic base can be selected from thegroup consisting of hydroxide, oxide, carbonate, and phosphate salts ofalkali, alkaline earth metals and mixtures thereof. In some embodiments,such inorganic base is sodium hydroxide, potassium hydroxide, ormixtures thereof. In some embodiments of this invention, the basicaqueous solution is an aqueous solution of a quatemary ammoniumhydroxide of the formula NR₄OH wherein each R is independently hydrogen,a C₁ to C₁₆ alkyl group, aralkyl group, or substituted alkyl group,provided that not all R are hydrogens. Examples of NR₄OH compoundsinclude tetra-n-butylammonium hydroxide, tetra-n-propylammoniumhydroxide, tetraethylammonium hydroxide, tetramethylammonium hydroxide,benzyltrimethylammonium hydroxide, hexadecyltrimethyammonium hydroxide,choline hydroxide, and mixtures thereof.

Optionally, the starting material is reacted with the basic aqueoussolution in the presence of an organic solvent. In some embodiments ofthis invention, the organic solvent is selected from the groupconsisting of benzene and its derivatives, alcohols, alkyl halides,alkyl nitriles, ethers, amides, ketones, sulfoxides, phosphate estersand mixtures thereof.

Optionally, the starting material is reacted with the basic aqueoussolution in the presence of a phase transfer catalyst. As used herein,the term “phase transfer catalyst” is intended to mean a substance thatfacilitates the transfer of ionic compounds into an organic phase froman aqueous phase or from a solid phase. A phase transfer catalystfacilitates the reaction between water-soluble and water-insolublereaction components. In some embodiments of this invention, the phasetransfer catalyst is selected from the group consisting of crown ethers,onium salts, cryptands, polyalkylene glycols, and mixtures andderivatives thereof. The phase transfer catalyst can be ionic orneutral. In some embodiments of this invention, onium salts includequatemary phosphonium salts and quatemary ammonium salts. Examples ofquatemary ammonium salts include tetra-n-butylammonium hydroxide,tetramethylammonium chloride, tetramethylammonium bromide,benzyltriethylammonium chloride, methyltri-n-octylammonium chloride(also known as Aliqua™ 336), dodecyltrimethylammonium bromide,tetra-n-butylammonium chloride, tetra-n-butylammonium bromide,tetra-n-butylammonium hydrogen sulfate, tetra-n-butylphosphoniumchloride, tetraphenyiphosphonium bromide, tetraphenylphosphoniumchloride, triphenylmethylphosphonium bromide, triphenylmethylphosphoniumchloride, and mixtures thereof.

The dehydrohalogenation using a basic aqueous solution has also beendisclosed in PCT Publication No. WO2010/129844.

In some embodiments of this invention, during the dehydrohalogenatingstep, starting materials selected from the group consisting ofCF₃CFClCH₃ (HCFC-244bb), CF₃CHFCH₂Cl (HCFC-244eb), CF₃CHClCH₂F(HCFC-244db), CF₃CH₂CHFCl (HCFC-244fa), CF₃CHFCH₂F (HFC-245eb),CF₃CH₂CF₂H (HFC-245fa), and CF₃CF₂CH₃ (HFC-245cb) are dehydrohalogenatedto form either CF₃CF═CH₂ or CF₃CH═CHF product. In other embodiments ofthis invention, during the dehydrohalogenating step, starting materialsselected from the group consisting of CF₃CFClCH₃ (HCFC-244bb),CF₃CHFCH₂F (HFC-245eb), and CF₃CF₂CH₃ (HFC-245cb) are dehydrohalogenatedto form CF₃CF═CH₂. In some embodiments of this invention, the at leastone starting material is selected from the group consisting ofCF₃CFClCH₃, CF₃CHFCH₂Cl, CF₃CHFCH₂F, CF₃CF₂CH₃, and mixtures thereof,and the at least one hydrotetrafluoropropene product is CF₃CF═CH₂. Insome embodiments of this invention, the at least one starting materialis CF₃CFClCH₃, and the at least one hydrotetrafluoropropene product isCF₃CF═CH₂ (i.e., the starting material CF₃CFClCH₃ is dehydrochlorinatedto produce a product mixture comprising CF₃CF═CH₂ product and CF₃C≡CHimpurity). In some embodiments of this invention, the at least onestarting material is CF₃CHFCH₂F, and the at least onehydrotetrafluoropropene product is CF₃CF═CH₂ (i.e., the startingmaterial CF₃CHFCH₂F is dehydrofluorinated to produce a product mixturecomprising CF₃CF═CH₂ product and CF₃C≡CH impurity). In some embodimentsof this invention, the at least one starting material is selected fromthe group consisting of CF₃CH₂CHF₂, CF₃CH₂CHFCl, CF₃CHClCH₂F, andmixtures thereof, and the at least one hydrotetrafluoropropene productis CF₃CH═CHF. In an embodiment, the at least one starting material isselected from the group consisting of CF₃CH₂CHF₂, CF₃CH₂CHFCl,CF₃CHClCH₂F, and mixtures thereof, and the at least onehydrotetrafluoropropene product is CF₃CH═CHF and the zeolite utilizedcomprises zeolite having pore opening of at least about 5 Angstroms andSanderson electronegativity of no more than about 2.6, and mixturesthereof

In some embodiments of this invention, during the dehydrohalogenatingstep, starting materials selected from the group consisting ofCF₃CCl₂CH₃ (HCFC-243ab), CF₃CHClCH₂Cl (HCFC-243db), CF₃CHClCH₂F(HCFC-244db), CF₃CH₂CHCl₂ (HCFC-243fa), CF₃CHFCH₂Cl (HCFC-244eb),CF₃CFClCH₃ (HCFC-244bb), and CF₃CH₂CHFCl (HCFC-244fa) aredehydrohalogenated to form either CF₃CCl═CH₂ or CF₃CH═CHCl product. Insome embodiments of this invention, the at least one starting materialis selected from the group consisting of CF₃CHClCH₂Cl, CF₃CH₂CHCl₂, andmixtures thereof, and the at least one hydrochlorotrifluoropropeneproduct is CF₃CH═CHCl (i.e., the at least one starting material selectedfrom the group consisting of CF₃CHClCH₂Cl, CF₃CH₂CHCl₂, and mixturesthereof is dehydrochlorinated to produce a product mixture comprisingCF₃CH═CHCl product and CF₃C≡CH impurity). In some embodiments of thisinvention, the at least one starting material is selected from the groupconsisting of CF₃CHClCH₂Cl, CF₃CCl₂CH₃, and mixtures thereof, and the atleast one hydrochlorotrifluoropropene product is CF₃CHCl═CH₂ (i.e., theat least one starting material selected from the group consisting ofCF₃CHClCH₂Cl, CF₃CCl₂CH₃, and mixtures thereof is dehydrochlorinated toproduce a product mixture comprising CF₃CHCl═CH₂ product and CF₃C≡CHimpurity).

During the dehydrohalogenating step, alkyne byproduct, such as CF₃C≡CHis also generated. During the contacting step, the product mixture ofhydrotetrafluoropropene or hydrochlorotrifluoropropene product and thealkyne impurity, such as CF₃C≡CH impurity is scrubbed with the suitablezeolite as described in this disclosure by using the contacting stepprocesses as also described in this disclosure.

In some embodiments of this invention, the concentration of the alkyneimpurity, such as CF₃C≡CH is reduced to 300 ppm or less in thecontacting step (b). In some embodiments of this invention, it isreduced to 200 ppm or less. In some embodiments of this invention, it isreduced to 100 ppm or less. In some embodiments of this invention, theamount of the alkyne impurity, e.g., CF₃C≡CH impurity, in thehydrotetrafluoropropene or hydrochlorotrifluoropropene product mixtureis reduced in the contacting step by at least about 20% by weightrelative to the amount originally present. In some embodiments of thisinvention, it is reduced at least about 30% by weight relative to theamount originally present. In some embodiments of this invention, it isreduced at least about 45% by weight relative to the amount originallypresent.

In some embodiments of this invention, the concentration of the alkyneimpurity, e.g., CF₃C≡CH impurity, in the product mixture comprisingCF₃C≡CH impurity and CF₃CF═CH₂ product is reduced to 300 ppm or less inthe contacting step (b). In some embodiments of this invention, it isreduced to 200 ppm or less. In some embodiments of this invention, it isreduced to 100 ppm or less. In some embodiments of this invention, theamount of the alkyne impurity, e.g., CF3C═CH impurity, in the productmixture comprising CF₃C≡CH impurity and CF₃CF═CH₂ product is reduced inthe contacting step (b) by at least about 20% by weight relative to theamount originally present. In some embodiments of this invention, it isreduced at least about 30% by weight relative to the amount originallypresent. In some embodiments of this invention, it is reduced at leastabout 45% by weight relative to the amount originally present.

In some embodiments of this invention, the concentration of the alkyne,e.g., CF₃C≡CH impurity, in the product mixture comprising CF₃C≡CHimpurity and CF₃CH═CHF product is reduced to 300 ppm or less in thecontacting step (b). In some embodiments of this invention, it isreduced to 200 ppm or less. In some embodiments of this invention, it isreduced to 100 ppm or less. In some embodiments of this invention, theamount of the alkyne impurity, e.g., CF₃C≡CH impurity, in the productmixture comprising CF₃C≡CH impurity and CF₃CH═CHF product is reduced inthe contacting step (b) by at least about 20% by weight relative to theamount originally present. In some embodiments of this invention, it isreduced at least about 30% by weight relative to the amount originallypresent. In some embodiments of this invention, it is reduced at leastabout 45% by weight relative to the amount originally present.

The hydrotetrafluoropropene or hydrochlorotrifluoropropene productobtained from the contacting step (b) can be recovered using therecovering step processes as described in this disclosure. In someembodiments of this invention, various azeotropic or azeotrope-like(i.e., near azeotrope) compositions of the hydrotetrafluoropropene orhydrochlorotrifluoropropene product may be utilized in the processes ofrecovering these products. For example, HF can be added to theHFO-1234yf product mixture obtained from the contacting step (b), andseparation of HFO-1234yf includes isolation of azeotrope or nearazeotrope of HFO-1234yf and HF and subjecting the azeotrope or nearazeotrope of HFO-1234yf and HF to further processing to produce HF-freeHFO-1234yf by using procedures similar to that disclosed in U.S. Pat.No. 7,897,823. Azeotrope or near azeotrope compositions of HFO-1234yfand HF have been disclosed in U.S. Pat. No. 7,476,771, and the processdescribed therein may also be utilized for recovering thehydrotetrafluoropropene or hydrochlorotrifluoropropene product. Foranother example, HF can be added to the HFO-1234ze product mixtureobtained from the contacting step (b), and separation of HFO-1234zeincludes isolation of azeotrope or near azeotrope of HFO-1234ze andsubjecting the azeotrope or near azeotrope of HFO-1234ze and HF tofurther processing to produce HF-free HFO-1234ze by using proceduressimilar to that disclosed in U.S. Pat. No. 7,897,823. U.S. Pat. No.7,423,188 discloses azeotrope or near-azeotrope compositions of theE-isomer of HFO-1234ze and HF, and U.S. Patent Publication No.2010-0200798 discloses azeotrope or near-azeotrope compositions of theZ-isomer of HFO-1234ze and HF, and the techniques applied therein may beutilized to recover HF-free HFO-1234ze. For another example, HF can beadded to the HCFO-1233xf product mixture obtained from the contactingstep (b), and separation of HCFO-1233xf includes isolation of azeotropeor near azeotrope of HCFO-1233xf and HF and subjecting the azeotrope ornear azeotrope of HFO-1234xf and HF to further processing to produceHF-free HCFO-1233xf by using procedures similar to that disclosed inU.S. Pat. No. 7,897,823. The azeotrope compositions of HCFO-1233xf andHF has been disclosed in U.S. Patent Publication No. 2010-0072415, andthe techniques for recovering HF-free HCFO-1233xf are applicable forrecovering. For another example, HF can be added to the HCFO-1233zdproduct mixture obtained from the contacting step (b), and separation ofHCFO-1233zd includes isolation of azeotrope or near azeotrope ofHCFO-1233zd and HF and HF-free HCFO-1233zd and subjecting the azeotropicHF-free HCFO-1233xf to further processing to produce HF-free HCFO-1233zdby using procedures similar to that disclosed in U.S. Pat. No.7,897,823. Some azeotrope compositions of HCFO-1233zd and HF have beendisclosed in U.S. Pat. No. 6,013,846, and the techniques utilizedtherein may be utilized to recover HCFO-1233zd.

The contacting vessels, reactors, distillation columns, and theirassociated feed lines, effluent lines, and associated units used inapplying the processes of embodiments of this invention should beconstructed of materials resistant to corrosion. Typical materials ofconstruction include stainless steels, in particular of the austenitictype, the well-known high nickel alloys, such as Monel™ nickel-copperalloys, Hastelloy™ nickel-based alloys and, Inconel™ nickel-chromiumalloys, and copper-clad steel.

Suitable Zeolites of this Disclosure:

Zeolites used in the processes of this invention are crystalline, highlyporous materials. They can be generically described as complexaluminosilicates characterized by a three-dimensional pore system. Thezeolite framework structure has corner-linked tetrahedra with Al or Siatoms at centers of the tetrahedra and oxygen atoms at the corners. Inorder to be a zeolite, the ratio (Si+Al)/O must equal %. Such tetrahedraare combined in a well-defined repeating structure comprising variouscombinations of 4-, 6-, 8-, 10-, and 12-membered rings. The resultingframework structure is one of regular channels and/or cages, which has apore network that is useful for separation or purification purposes. Thesize of pore opening is critical to the performance of zeolite inseparation or purification applications, since this characteristicdetermines whether molecules of certain size can enter and exit thezeolite pore system.

The size of the pore opening that controls access to the interior of thezeolites is determined not only by the geometric dimensions of thetetrahedra forming the pore opening, but also by the presence or absenceof ions in or near the pore. For example, in the case of zeolite A,access can be restricted by monovalent ions, such as Na⁺ or K⁺, whichare situated in or near 8-member ring openings as well as 6-member ringopenings. Access can be enhanced by divalent ions, such as Ca²⁺, whichare situated only in or near 6-member ring openings. Thus, the potassiumand sodium salts of zeolite A exhibit pore openings of about 3 Angstromsand about 4 Angstroms respectively, whereas the calcium salt of zeoliteA has a pore opening of about 5 Angstroms.

The Sanderson electronegativity model (see R. T. Sanderson, “ChemicalBonds and Bond Energy”, 2^(nd) ed., Academic Press, New York, 1976(i.e., Sanderson 1976 model); R. T. Sanderson, “Electronegativity andBond Energy”, J. Amer. Chem. Soc. 1983, 105, 2259-2261 (i.e., Sanderson1983 model); W. J. Mortier, “Zeolite Electronegativity Related toPhysicochemical Properties”, J. Catal. 1978, 83, 138-145) fumishes auseful method for classifying zeolites based on their chemicalcomposition. In accordance with this invention the preferential sorptionof R_(f)C≡CX impurity by zeolites can be correlated with theirintermediate electronegativity (i.e., their S_(int), the geometric meanof the electronegativities) as determined by the Sanderson method basedupon chemical composition. According to Barthomeuf (D. Barthomeuf,“Acidity and Basicity in Zeolites”, In Catalysis and Adsorption inZeolites, G. Ohlmann et al., eds., Elsevier (1991), pages 157-169), anapparent S_(int) break point between acidity and basicity is at about3.5 (based on Sanderson 1976 model) or about 2.6 (based on Sanderson1983 model). In other words, generally, zeolites with S; of no more thanabout 2.6 (based on Sanderson 1983 model) tend to exhibit baseproperties, while those with Si greater than about 2.6 are acidic. Theterm “Sanderson electronegativity”, as used herein, refers to theS_(int) value based on Sanderson 1983 model.

Zeolites suitable for use in the processes of this invention areselected from the group consisting of zeolites having pore opening of atleast 4 Angstroms and no more than about 5 Angstroms, zeolites havingpore opening of at least about 5 Angstroms and Sandersonelectronegativity of no more than about 2.6, and mixtures thereof.Suitable zeolites in this disclosure do not include zeolite 4A.

Suitable zeolites include those having a pore opening of about 4.1, 4.2,4.3, 4.4, 4.5, 4.6, 4.7, 4.8, 4.9, 5.0, or 5.1 Angstroms.

Suitable zeolites also include those having a Sandersonelectronegativity of no more than about 2.61, 2.60, 2.59, 2.58, 2.57,2.56, 2.55, 2.54, 2.53, 2.52, 2.51, 2.50, 2.49, 2.48, 2.47, 2.46, 2.45,2.44, 2.43, 2.42, 2.41, 2.40, 2.39, or 2.38.

In some embodiments of this invention, zeolites have a Sandersonelectronegativity of no more than about 2.56. In some embodiments ofthis invention, zeolites have a Sanderson electronegativity of no morethan about 2.38.

In some embodiments of this invention, zeolites have a pore opening ofat least 4 Angstroms and no more than about 5 Angstroms. These zeolitesare not restricted to those zeolites having a Sandersonelectronegativity of no more than about 2.6. However, in an embodiment,the zeolites have a pore opening of at least 4 Angstroms and no morethan about 5 Angstroms and a Sanderson electronegativity of no more thanabout 2.6.

In some embodiments of this invention, zeolites have a pore opening ofat least about 5 Angstroms and have a Sanderson electronegativity of nomore than about 2.6.

In some embodiments of this invention, zeolites have a pore opening ofat least about 5 Angstroms and have a Sanderson electronegativity of nomore than about 2.56.

In some embodiments of this invention, zeolites are selected from thegroup consisting of zeolite 5A, zeolite 13X, zeolite LSX, zeoliteAW-300, zeolite AW-500, and mixtures thereof.

In some embodiments of this invention, zeolites are selected from thegroup consisting of zeolite 5A, zeolite 13X, zeolite AW-300, zeoliteAW-500, and mixtures thereof.

In some embodiments of this invention, zeolites are selected from thegroup consisting of zeolite 5A, zeolite 13X, and mixtures thereof.

In some embodiments of this invention, zeolites are selected from thedivalent cation forms of zeolite A, such as Ca²⁺, Sr²⁺, Ba²⁺, Cd²⁺, andZn²⁺.

Mixtures of any of the aforementioned zeolites may also be used inpracticing this invention.

Zeolites are typically pre-treated before use by heating, optionally ina dry gas stream. The pre-treatment temperature is typically in therange of from about 100° C. to about 550° C. The dry gas stream istypically dry air or dry nitrogen.

This invention can be practiced with the zeolite or molecular sievecontained in a stationary packed bed through which the process streamwhose components need separation are passed. Alternatively, it can bepracticed with the zeolite or molecular sieve applied as acountercurrent moving bed; or with a fluidized bed where the sorbentitself is moving. It can be applied with the zeolite or molecular sievecontained as a stationary packed bed, but the process configured as asimulated moving bed, where the point of introduction to the bed of theprocess stream requiring separation is changed, such as may be effectedusing appropriate switching valves.

Example of Use of Present Invention

The removal of CF₃C≡CH impurity from the final product, namelyHFO-1234yf using techniques known in the art heretofore, will incurextra cost and possibly yield loss as well. But, the present inventionprovides methods of removing CF₃C≡CH from the reactor feed to improvethe overall efficiency of the HFO-1234yf conversion process.

An aspect of the present invention is the preparation of HFO-1234yf thatis substantially free of 3,3,3-trifluoropropyne comprising:

-   -   (i) providing a starting composition including a compound of        Formulae I, II, or III:        CX₂═CCl—CH₂X  (I);        CX₃—CCl═CH₂  (II); or        CX₃—CHCl—CH₂X  (III)    -    wherein X is independently selected from F, Cl, Br, and I,        provided that at least one X is not fluorine;    -   (ii) contacting the starting composition with a first        fluorinating agent to produce a first intermediate composition        including 2-chloro-3,3,3-trifluoropropene and a first        chlorine-containing byproduct;    -   (iii) contacting the first intermediate composition with a        second fluorinating agent to produce a second intermediate        composition including 2-chloro-1,1,1,2-tetrafluoropropane and        2-chloro-3,3,3-trifluoropropene;    -   (iv) dehydrochlorinating at least a portion of the second        intermediate composition including        2-chloro-1,1,1,2-tetrafluoropropane and        2-chloro-3,3,3-trifluoropropene to produce a reaction product        including 2,3,3,3-tetrafluoropropene and CF₃C≡CH impurity;    -   (v) contacting the product of step iv with at least one zeolite,        wherein said at least one zeolite is selected from the group        consisting of zeolites having pore opening of at least 4        Angstroms and no more than about 5 Angstroms, zeolites having        pore opening of at least about 5 Angstroms and Sanderson        electronegativity of no more than about 2.6, and mixtures        thereof; provided that said at least one zeolite is not zeolite        4A, to provide 2,3,3,3-tetrafluoropropene, said reaction product        being substantially free of said CF₃C≡CH impurity; and    -   (vi) recovering said 2,3,3,3-tetrafluoropropene produced in        step (v) having reduced concentration of said CF₃C≡CH impurity.

In certain aspects, the preparation of HFO-1234yf generally includes atleast three reaction steps, as follows:

-   -   (1) (CX₂═CCl—CH₂X or CX₃—CCl═CH₂ or        CX₃—CHCl—CH₂X)+HF→2-chloro-3,3,3-trifluoropropene        (HCFO-1233xf)+HCl in a vapor phase reactor charged with a solid        catalyst;    -   (2) 2-chloro-3,3,3-trifluoropropene        (HCFO-1233xf)+HF→2-chloro-1,1,1,2-tetrafluoropropane        (HCFC-244bb) in a liquid phase reactor charged with a liquid        hydrofluorination catalyst; and    -   (3) 2-chloro-1,1,1,2-tetrafluoropropane        (HCFC-244bb)→2,3,3,3-tetrafluoropropene (HFO-1234yf) in a vapor        phase reactor.

wherein X is independently selected from F, Cl, Br, and I, provided thatat least one X is not fluorine.

Generally speaking, the starting material of the first reaction step maybe represented by one or more chlorinated compounds according toFormulas I, II, and/or III:CX₂═CCl—CH₂X  (Formula I)CX₃—CCl═CH₂  (Formula (II)CX₃—CHCl—CH₂X  (Formula III)wherein X is independently selected from F, Cl, Br, and I, provided thatat least one X is not fluorine. In certain embodiments, these compoundscontain at least one chlorine, a majority of X is chlorine, or all X ischlorine.

In the first step, such starting materials (which, in certainembodiments includes 1,1,2,3-tetrachloropropene (1230xa) and/or1,1,1,2,3-pentachloropropane (HCC-240db)) is reacted with anhydrous HFin a first vapor phase reactor (fluorination reactor) to produce amixture of at least HCFO-1233xf (2-chloro-3,3,3-trifluoropropene) andHCl. The reaction can be carried out at a temperature of about 200-400°C. and a pressure of about 0-200 psig. The effluent stream exiting thevapor phase reactor may optionally comprise additional components, suchas un-reacted HF, heavy intermediates, HCFC-244bb, HFC-245cb(1,1,1,2,2-pentafluoropropane), or the like.

This reaction may be conducted in any reactor suitable for a vapor phasefluorination reaction. The reactor may be constructed from materialswhich are resistant to the corrosive effects of hydrogen fluoride andcatalyst such as Hastalloy, Inconel, Monel. In case of a vapor phaseprocess, the reactor is filled with a vapor phase fluorination catalyst.Any fluorination catalysts known in the art may be used in this process.Suitable catalysts include, but are not limited to chromium, aluminum,cobalt, manganese, nickel and iron oxides, hydroxides, halides,oxyhalides, inorganic salts thereof and their mixtures any of which maybe optionally halogenated. Catalysts suitable for the present inventionnonexclusively include Cr₂O₃, FeCl₃/C, Cr₂O₃/Al₂O₃, Cr₂O₃/AlF₃,Cr₂O₃/carbon, CoCl₂/Cr₂O₃/Al₂O₃, NiCl₂/Cr₂O₃/Al₂O₃, CoCl₂/AlF₃,NiCl₂/AlF₃ and mixtures thereof. Chromium oxide/aluminum oxide catalystsare described in U.S. Pat. No. 5,155,082, the contents of which areincorporated herein by reference. Chromium (III) oxides such ascrystalline chromium oxide or amorphous chromium oxide are suitablecatalysts and in an embodiment, the catalyst used in this step isamorphous chromium oxide. Chromium oxide (Cr₂O₃) is a commerciallyavailable material which may be purchased in a variety of particlesizes. Fluorination catalysts having a purity of at least 98% arepreferred. The fluorination catalyst is present in an excess but in atleast an amount sufficient to drive the reaction.

This first step of the reaction is not necessarily limited to a vaporphase reaction, as described above, but may also be performed using aliquid phase reaction or a combination of liquid and vapor phases, suchas that disclosed in U.S. Published Patent Application No. 20070197842,the contents of which are incorporated herein by reference. It is alsocontemplated that the reaction can be carried out batch wise,continuously, or a combination of these. For embodiments in which thereaction comprises a liquid phase reaction, the reaction can becatalytic or non-catalytic. Lewis acid catalysts, such as metal-halidecatalysts, including antimony halides, tin halides, thallium halides,iron halides, and combinations of two or more of these, may be employed.In certain embodiments, metal chlorides and metal fluorides areemployed, including, but not limited to, SbC₅, SbCl₃, SbF₅, SnCl₄,TiCl₄, FeCl₃ and combinations of two or more of these.

The effluent from the reactor may be optionally processed to achievedesired degrees of separation and/or other processing. By way ofnon-limiting example, the product effluent may contain one or moreimpurities, such as, HCl, unconverted reactants, and/or otherby-products. These products may be removed using standard methods knownor otherwise discussed herein. HCl, for example, can be recovered byconventional distillation, or using water or caustic scrubbers, asdiscussed in greater detail below, and the unreacted starting reagentsisolated and recycled.

In the second step of the process for forming2,3,3,3-tetrafluoropropene, HCFO-1233xf is converted to HCFC-244bb. Inone embodiment, this step may be performed in the liquid phase in aliquid phase reactor, which may be TFE or PFA-lined. Such a process maybe performed in a temperature range of about 70-120° C. and about 50-120psig.

Any liquid phase fluorination catalyst may be used in the invention. Anon-exhaustive list includes Lewis acids, transition metal halides,transition metal oxides, Group IVb metal halides, a Group Vb metalhalides, or combinations thereof. Non-exclusive examples of liquid phasefluorination catalysts are an antimony halide, a tin halide, a tantalumhalide, a titanium halide, a niobium halide, and molybdenum halide, aniron halide, a fluorinated chrome halide, a fluorinated chrome oxide orcombinations thereof. Specific non-exclusive examples of liquid phasefluorination catalysts are SbCl₅, SbC₃, SbF₅, SnCl₄, TaCl₅, TiCl₄,NbCl₅, MoCl₆, FeC₃, a fluorinated species of SbCl₅, a fluorinatedspecies of SbCl₃, a fluorinated species of SnCl₄, a fluorinated speciesof TaCl₅, a fluorinated species of TiCl₄, a fluorinated species ofNbCl₅, a fluorinated species of MoCl₆, a fluorinated species of FeCl₃,or combinations thereof. Antimony pentachloride is most preferred.

These catalysts can be readily regenerated by any means known in the artif they become deactivated. One suitable method of regenerating thecatalyst involves flowing a stream of chlorine through the catalyst. Forexample, from about 0.002 to about 0.2 lb per hour of chlorine can beadded to the liquid phase reaction for every pound of liquid phasefluorination catalyst. This may be done, for example, for from about 1to about 2 hours or continuously at a temperature of from about 65° C.to about 100° C.

This second step of the reaction is not necessarily limited to a liquidphase reaction and may also be performed using a vapor phase reaction ora combination of liquid and vapor phases, such as that disclosed in U.S.Published Patent Application No. 20070197842, the contents of which areincorporated herein by reference. To this end, the HCFO-1233xfcontaining feed stream is preheated to a temperature of from about 50°C. to about 400° C., and is contacted with a catalyst and fluorinatingagent. Catalysts may include standard vapor phase agents used for such areaction and fluorinating agents may include those generally known inthe art, such as, but not limited to, hydrogen fluoride.

In the third step of HFO-1234yf production, HCFC-244bb is fed to asecond vapor phase reactor (dehydrochlorination reactor) to bedehydrochlorinated to make the desired product2,3,3,3-tetrafluoropropene (HFO-1234yf). This reactor can either benon-catalytic or it can contain a catalyst that can catalyticallydehydrochlorinate HCFC-244bb to make HFO-1234yf.

The catalysts, if present, may be metal halides, halogenated metaloxides, neutral (or zero oxidation state) metal or metal alloy, oractivated carbon in bulk or supported form. Metal halide or metal oxidecatalysts may include, but are not limited to, mono-, bi-, andtri-valent metal halides, oxides and their mixtures/combinations, andmore preferably mono-, and bi-valent metal halides and theirmixtures/combinations. Component metals include, but are not limited to,Cr³⁺, Fe³⁺, Mg²⁺, Ca²⁺, Ni²⁺, Zn²⁺, Pd²⁺, Li⁺, Na⁺, K⁺, and Cs⁺.Component halogens include, but are not limited to, F, Cl, Br, and I.Examples of useful mono- or bi-valent metal halide include, but are notlimited to, LiF, NaF, KF, CsF, MgF₂, CaF₂, LiCl, NaCl, KCl, and CsCl.Halogenation treatments can include any of those known in the prior art,particularly those that employ HF, F₂, HCl, Cl₂, HBr, Br₂, Hl, and I₂ asthe halogenation source.

When neutral, i.e., zero valent, metals, metal alloys and their mixturesare used. Useful metals include, but are not limited to, Pd, Pt, Rh, Fe,Co, Ni, Cu, Mo, Cr, Mn, and combinations of the foregoing as alloys ormixtures. The catalyst may be supported or unsupported. Useful examplesof metal alloys include, but are not limited to, SS 316, Monel 400,Incoloy 825, Alloy 20, Hastelloy, Inconel 600, and Inconel 625.

In an aspect of the present invention, in this step, catalysts includeactivated carbon, stainless steel (e.g., SS 316), austeniticnickel-based alloys (e.g., Inconel 625), nickel, and in certainembodiments fluorinated 10% CsCl/MgO. A suitable reaction temperature isabout 300-550° C. and a suitable reaction pressure may be between about0-150 psig. The reactor effluent may be fed to a caustic scrubber or toa distillation column to remove the byproduct of HCl to produce anacid-free organic product which, optionally, may undergo furtherpurification using one or any combination of purification techniquesthat are known in the art.

The reaction may be carried out at a temperature range of from about200° C. to about 800° C., from about 300° C. to about 600° C., or fromabout 400° C. to about 500° C. Suitable reactor pressures range fromabout 0 psig to about 200 psig, from about 10 psig to about 100 psig, orfrom about 20 to about 70 psig.

In general, the effluent from the dehydrochlorination reactor may beprocessed to achieve desired degrees of separation and/or otherprocessing. Besides HFO-1234yf produced, the effluent generally containsHCl, unconverted HCFC-244bb, and HCFO-1233xf (which is mainly carriedover from the previous step of HCFO-1233xf hydrofluorination).Optionally, HCl is then recovered from the result of thedehydrochlorination reaction. Recovery of HCl is conducted byconventional distillation where it is removed from the distillate.Alternatively, HCl can be recovered or removed by using water or causticscrubbers. When a water extractor is used, HCl is removed as an aqueoussolution. When a caustic solution is used, HCl is removed from system asa chloride salt in aqueous solution. After the recovery or removal ofHCl, the organic stream may be sent to a distillation column forseparation. HFO-1234yf, collected from the overhead of the column, maybe sent to another column for further purification, while a fraction ofthe mixture of HCFO-1233xf and HCFC-244bb, accumulated in the reboiler,may be sent back to the dehydrochlorination reactor for the recycle ofHCFC-244bb, and the rest to the HCFO-1233xf hydrofluorination reactorfor the recycle of HCFO-1233xf.

The HFO-1234 so produced is then contacted with the molecular sieves, inaccordance with the present invention, to remove the CF₃C≡CH impurity.In an embodiment, before the removal of the CF₃C≡CH impurity from theHFO-1234, the concentration of the CF₃C≡CH impurity present may bemeasured using techniques known in the art, such as gas chromatography.

Many aspects and embodiments have been described above and are merelyexemplary and not limiting. After reading this specification, skilledartisans appreciate that other aspects and embodiments are possiblewithout departing from the scope of the invention.

EXAMPLES

The concepts described herein will be further described in the followingexamples, which do not limit the scope of the invention described in theclaims.

The term “% by GC-FID”, as used herein, means the percentage of the peakarea measured on the GC-FID spectrum.

Activation of Zeolite

Zeolites were activated following procedures below before use inExamples 1-13.

Zeolite was heated in air at a rate of 30° C./minute to 525° C. and heldat 525° C. for 10 minutes. It was then heated to 550° C. at a rate of 2°C./minute and held at 550° C. for 8 hours before cooled to 110° C.

Examples 1-2 (Comparative)

Examples 1-2 demonstrate that the CF₃C≡CH impurity contained inHFO-1234yf can not be removed by zeolite 3A. Zeolite 3A has a poreopening of about 3 Angstroms and has a Sanderson electronegativity ofabout 2.25.

A gaseous HFO-1234yf sample containing CF₃C≡CH impurity as indicated inTable 1 passed through a scrubber (7 inch length, 1.25 inch ID)containing about 100 ml activated zeolite 3A at room temperature. Theeffluent gas from the scrubber was analyzed by GC and GC-MS. Theanalysis results are also listed in Table 1.

Examples 3-4 (Comparative)

Examples 3-4 demonstrate that the CF₃C≡CH impurity contained inHFO-1234yf can not be removed by zeolite 4A. Zeolite 4A has a poreopening of about 4 Angstroms and has a Sanderson electronegativity ofabout 2.32.

A gaseous HFO-1234yf sample containing CF₃C≡CH impurity as indicated inTable 1 passed through a scrubber (7 inch length, 1.25 inch ID)containing about 100 ml activated zeolite 4A at room temperature. Theeffluent gas from the scrubber was analyzed by GC and GC-MS. Theanalysis results are also listed in Table 1.

Examples 5-7

Examples 5-7 demonstrate that the concentration of the CF₃C≡CH impurityin its mixture with HFO-1234yf can be substantially reduced aftercontacting with zeolite 5A. Zeolite 5A has a pore opening of about 5Angstroms and has a Sanderson electronegativity of about 2.56.

A gaseous HFO-1234yf sample containing CF₃C≡CH impurity as indicated inTable 1 passed through a scrubber (7 inch length, 1.25 inch ID)containing about 100 ml activated zeolite 5A at room temperature. Theeffluent gas from the scrubber was analyzed by GC and GC-MS. Theanalysis results are also listed in Table 1.

Examples 8-9

Examples 8-9 demonstrate that the concentration of the CF₃C≡CH impurityin its mixture with HFO-1234yf can be substantially reduced aftercontacting with zeolite 13X. Zeolite 13X has a pore opening of about 8Angstroms and has a Sanderson electronegativity of about 2.38.

A gaseous HFO-1234yf sample containing CF₃C≡CH impurity as indicated inTable 1 passed through a scrubber (7 inch length, 1.25 inch ID)containing about 100 ml activated zeolite 13X at room temperature. Theeffluent gas from the scrubber was analyzed by GC and GC-MS. Theanalysis results are also listed in Table 1.

Examples 10-11 (Comparative)

Examples 10-11 demonstrate that the CF₃C≡CH impurity contained inHFO-1234yf can not be removed by zeolite CBV-600. Zeolite CBV-600 has apore opening of about 8 Angstroms and has a Sanderson electronegativityof about 2.95.

A gaseous HFO-1234yf sample containing CF₃C≡CH impurity as indicated inTable 1 passed through a scrubber (7 inch length, 1.25 inch ID)containing about 100 ml activated zeolite CBV-600 at room temperature.The effluent gas from the scrubber was analyzed by GC and GC-MS. Theanalysis results are also listed in Table 1.

Example 12

Example 12 demonstrates that the concentration of the CF₃C≡CH impurityin its mixture with HFO-1234yf can be reduced after contacting withzeolite AW-300. Zeolite AW-300 has a pore opening of about 4 Angstromsand has a Sanderson electronegativity of about 2.85.

A gaseous HFO-1234yf sample containing CF₃C≡CH impurity as indicated inTable 1 passed through a scrubber (7 inch length, 1.25 inch ID)containing about 100 ml activated zeolite AW-300 at room temperature.The effluent gas from the scrubber was analyzed by GC and GC-MS. Theanalysis results are also listed in Table 1.

Example 13

Example 13 demonstrates that the concentration of the CF₃C≡CH impurityin its mixture with HFO-1234yf can be reduced after contacting withzeolite AW-500. Zeolite AW-500 has a pore opening of about 4 Angstromsand has a Sanderson electronegativity of about 2.77.

A gaseous HFO-1234yf sample containing CF₃C≡CH impurity as indicated inTable 1 passed through a scrubber (7 inch length, 1.25 inch ID)containing about 100 ml activated zeolite AW-500 at room temperature.The effluent gas from the scrubber was analyzed by GC and GC-MS. Theanalysis results are also listed in Table 1.

TABLE 1 CF₃C≡CH Concentration (% by Flow GC-FID) Change of ExampleScrubber Rate Before After CF₃C≡CH No. (Zeolite) (sccm) ScrubbingScrubbing Concentration 1 3A 24.7 0.17 0.17  0% 2 3A 11.1 0.17 0.17  0%3 4A 25.0 0.17 0.17  0% 4 4A 9.4 0.17 0.17  0% 5 5A 25.0 0.21 0.12 −45%6 5A 24.7 0.15 0.11 −31% 7 5A 11.1 0.15 0.09 −43% 8 13X 27.0 0.19 0.15−23% 9 13X 11.1 0.20 0.12 −39% 10 CBV-600 10.7 0.15 0.15  0% 11 CBV-60026.8 0.163 0.165 0.02%  12 AW-300 10.3 0.134 0.117 −13% 13 AW-500 9.20.118 0.107  −9%

Note that not all of the activities described above in the generaldescription or the examples are required, that a portion of a specificactivity may not be required, and that one or more further activitiesmay be performed in addition to those described. Still further, theorder in which activities are listed is not necessarily the order inwhich they are performed.

In the foregoing specification, the concepts have been described withreference to specific embodiments. However, one of ordinary skill in theart appreciates that various modifications and changes can be madewithout departing from the scope of the invention as set forth in theclaims below. Accordingly, the specification is to be regarded in anillustrative rather than a restrictive sense, and all such modificationsare intended to be included within the scope of invention.

Benefits, other advantages, and solutions to problems have beendescribed above with regard to specific embodiments. However, thebenefits, advantages, solutions to problems, and any feature(s) that maycause any benefit, advantage, or solution to occur or become morepronounced are not to be construed as a critical, required, or essentialfeature of any or all the claims.

It is to be appreciated that certain features are, for clarity,described herein in the context of separate embodiments, may also beprovided in combination in a single embodiment. Conversely, variousfeatures that are, for brevity, described in the context of a singleembodiment, may also be provided separately or in any subcombination.

What is claimed is:
 1. A process comprising: contacting a mixturecomprising at least one fluoroolefin and at least one R_(f)C≡CX impuritywith at least one zeolite to reduce the concentration of said at leastone R_(f)C≡CX impurity in said mixture; wherein: (a) R_(f) is astraight-chain perfluorinated alkyl group, and X is H, F, Cl, Br or I;and (b) said at least one zeolite is selected from the group consistingof zeolites having pore opening of at least 4 Angstroms and no more thanabout 5 Angstroms, zeolites having pore opening of at least about 5Angstroms and Sanderson electronegativity of no more than about 2.6, andmixtures thereof; provided that said at least one zeolite is not zeolite4A.
 2. The process of claim 1 wherein the amount of said at least onefluoroolefin in said mixture is at least 90 wt % based on the totalweight of said mixture.
 3. The process of claim 1 wherein said at leastone fluoroolefin is selected from the group consisting of CF₃CF═CH₂,CF₃CH═CHF, CF₃CH═CH₂, CF₃CCl═CH₂, CF₃CH═CHCl, CF₃CH═CFCl, CF₃CH═CF₂,CF₃CCl═CHF, CF₃CF═CHF, CF₃CF═CHCl, CF₃CH═CCl₂, CF₃CCl═CHCl, and mixturesthereof, and wherein said at least one R_(f)C≡CX impurity is selectedfrom the group consisting of CF₃C≡CH, CF₃C≡CCl, CF₃C≡CF, and mixturesthereof.
 4. The process of claim 1 wherein said at least onefluoroolefin is selected from the group consisting of CF₃CF═CH₂,CF₃CH═CHF, CF₃CH═CH₂, CF₃CCl═CH₂, CF₃CH═CHCl, CF₃CF═CHCl, and mixturesthereof, and wherein said at least one R_(f)C≡CX impurity is selectedfrom the group consisting of CF₃C≡CH, CF₃C≡CCl, CF₃C≡CF, and mixturesthereof.
 5. The process of claim 1 wherein said at least onefluoroolefin is selected from the group consisting of CF₃CF═CH₂,CF₃CH═CHF, CF₃CCl═CH₂, CF₃CH═CHCl, and mixtures thereof and wherein saidat least one R_(f)C≡CX impurity is selected from the group consisting ofCF₃C≡CH, CF₃C≡CCl, and mixtures thereof.
 6. The process of claim 1wherein said at least one fluoroolefin is CF₃CF═CH₂, and wherein said atleast one R_(f)C≡CX impurity is selected from the group consisting ofCF₃C≡CH, CF₃C≡CCl, and mixtures thereof.
 7. The process of claim 1wherein said at least one fluoroolefin is CF₃CF═CH₂, and wherein said atleast one R_(f)C≡CX impurity is CF₃C≡CH.
 8. The process of claim 1wherein said at least one fluoroolefin is CF₃CH═CHF, and wherein said atleast one R_(f)C≡CX impurity is CF₃C≡CH.
 9. The process of claim 1wherein said at least one fluoroolefin is a mixture of CF₃CF═CH₂ andCF₃CH═CHF, and wherein said at least one R_(f)C≡CX impurity is CF₃C≡CH.10. The process of claim 1 wherein said at least one fluoroolefin isCF₃CH═CHCl, and wherein said at least one R_(f)C≡CX impurity is CF₃C≡CH.11. The process of claim 1 wherein said at least one zeolite has a poreopening of at least about 5 Angstroms and a Sanderson electronegativityof no more than about 2.6.
 12. The process of claim 1 wherein said atleast one zeolite is selected from the group consisting of zeolite 5A,zeolite 13X, zeolite LSX, zeolite AW-300, zeolite AW-500, and mixturesthereof.
 13. The process of claim 1 wherein said at least one zeolite iszeolite 5A, zeolite 13X, or mixtures thereof.
 14. The process of claim 1wherein the concentration of said at least one R_(f)C≡CX impurity insaid mixture is reduced to 300 ppm or less.
 15. The process of claim 1wherein the amount of said at least one R_(f)C≡CX impurity in saidmixture is reduced at least about 20%.
 16. The process of claim 1further comprising recovering said at least one fluoroolefin havingreduced concentration of said at least one R_(f)C≡CX impurity.
 17. Aprocess for making at least one hydrotetrafluoropropene product selectedfrom the group consisting of CF₃CF═CH₂, CF₃CH═CHF, and mixtures thereof,comprising: (a) dehydrohalogenating at least one starting materialselected from the group consisting of CF₃CFClCH₃, CF₃CHFCH₂Cl,CF₃CHClCH₂F, CF₃CH₂CHFCl, CF₃CHFCH₂F, CF₃CH₂CF₂H, CF₃CF₂CH₃, andmixtures thereof to produce a product mixture comprising CF₃C≡CHimpurity and said at least one hydrotetrafluoropropene product; (b)contacting said product mixture with at least one zeolite to reduce theconcentration of said CF₃C≡CH impurity in said product mixture; and (c)recovering said at least one hydrotetrafluoropropene product havingreduced concentration of said CF₃C≡CH impurity; wherein said at leastone zeolite is selected from the group consisting of zeolites havingpore opening of at least 4 Angstroms and no more than about 5 Angstroms,zeolites having pore opening of at least about 5 Angstroms and Sandersonelectronegativity of no more than about 2.6, and mixtures thereof;provided that said at least one zeolite is not zeolite 4A.
 18. Theprocess of claim 17 wherein said at least one hydrotetrafluoropropeneproduct is CF₃CF═CH₂, and said at least one starting material isselected from the group consisting of CF₃CFClCH₃, CF₃CHFCH₂Cl,CF₃CHFCH₂F, CF₃CF₂CH₃, and mixtures thereof.
 19. The process of claim 18wherein said at least one starting material is CF₃CFClCH₃.
 20. Theprocess of claim 18 wherein said at least one starting material isCF₃CHFCH₂F.
 21. The process of claim 17 wherein said at least onehydrotetrafluoropropene product is CF₃CH═CHF, and said at least onestarting material is selected from the group consisting of CF₃CH₂CHF₂,CF₃CH₂CHFCl, CF₃CHClCH₂F, and mixtures thereof.
 22. The process of 17wherein the concentration of said CF₃C≡CH impurity in said productmixture is reduced to 300 ppm or less in the contacting step (b). 23.The process of claim 17 wherein the contacting step (b) reduces theamount of said CF₃C≡CH impurity in said product by at least about 20% byweight relative to the amount originally present.
 24. A process formaking at least one hydrochlorotrifluoropropene product selected fromthe group consisting of CF₃CCl═CH₂, CF₃CH═CHCl, and mixtures thereof,comprising: (a) dehydrohalogenating at least one starting materialselected from the group consisting of CF₃CCl₂CH₃, CF₃CHClCH₂Cl,CF₃CHClCH₂F, CF₃CH₂CHCl₂, CF₃CHFCH₂Cl, CF₃CFClCH₃, CF₃CH₂CHFCl, andmixtures thereof to produce a product mixture comprising CF₃C≡CHimpurity and said at least one hydrochlorotrifluoropropene product; (b)contacting said product mixture with at least one zeolite to reduce theconcentration of said CF₃C≡CH impurity in said product mixture; and (c)recovering said at least one hydrochlorotrifluoropropene product havingreduced concentration of said CF₃C≡CH impurity; wherein said at leastone zeolite is selected from the group consisting of zeolites havingpore opening of at least 4 Angstroms and no more than about 5 Angstroms,zeolites having pore opening of at least about 5 Angstroms and Sandersonelectronegativity of no more than about 2.6, and mixtures thereof;provided that said at least one zeolite is not zeolite 4A.
 25. Theprocess of claim 24 wherein said at least onehydrochlorotrifluoropropene product is CF₃CH═CHCl, and said at least onestarting material is selected from the group consisting of CF₃CHClCH₂Cl,CF₃CH₂CHCl₂, and mixtures thereof.
 26. The process of claim 24 whereinsaid at least one hydrochlorotrifluoropropene product is CF₃CHCl═CH₂,and said at least one starting material is selected from the groupconsisting of CF₃CHClCH₂Cl, CF₃CCl₂CH₃, and mixtures thereof.
 27. Theprocess of claim 24 wherein the concentration of said CF₃C≡CH impurityin said product mixture is reduced to 300 ppm or less in the contactingstep (b).
 28. The process of claim 24 wherein the contacting step (b)reduces the amount of said CF₃C≡CH impurity in said product by at leastabout 20% by weight relative to the amount originally present.
 29. Theprocess of claim 17 wherein said at least one zeolite has a pore openingof at least about 5 Angstroms and has a Sanderson electronegativity ofno more than about 2.6.
 30. The process of claim 17 wherein said atleast one zeolite is selected from the group consisting of zeolite 5A,zeolite 13X, zeolite LSX, zeolite AW-300, zeolite AW-500, and mixturesthereof.
 31. The process of claim 17 wherein said at least one zeoliteis zeolite 5A, zeolite 13X, or mixtures thereof.
 32. A process forpreparing 2,3,3,3-tetrafluoropropene comprising: (i) providing astarting composition including a compound of Formulae I, II, or III:CX₂═CCl—CH₂X  (I);CX₃—CCl═CH₂  (II); orCX₃—CHCl—CH₂X  (III) wherein X is independently selected from F, Cl, Br,and I, provided that at least one X is not fluorine; (ii) contacting thestarting composition with a first fluorinating agent to produce a firstintermediate composition including 2-chloro-3,3,3-trifluoropropene and afirst chlorine-containing byproduct; (iii) contacting the firstintermediate composition with a second fluorinating agent to produce asecond intermediate composition including2-chloro-1,1,1,2-tetrafluoropropane and 2-chloro-3,3,3-trifluoropropene;(iv) dehydrochlorinating at least a portion of the second intermediatecomposition including 2-chloro-1,1,1,2-tetrafluoropropane to produce areaction product including 2,3,3,3-tetrafluoropropene and CF₃C≡CHimpurity; (v) contacting said reaction product produced in step (iv)with at least one zeolite to reduce the concentration of said CF₃C≡CHimpurity in said product mixture, wherein said at least one zeolite isselected from the group consisting of zeolites having pore opening of atleast 4 Angstroms and no more than about 5 Angstroms, zeolites havingpore opening of at least about 5 Angstroms and Sandersonelectronegativity of no more than about 2.6, and mixtures thereof;provided that said at least one zeolite is not zeolite 4A; and (vi)recovering said 2,3,3,3-tetrafluoropropene from said product mixture ofstep (v), said 2,3,3,3-tetrafluoropropene having reduced concentrationof said CF₃C≡CH impurity present relative to that amount originallypresent in said reaction product of step (iv).